Deposition method

Details Deposition method Deposition method

1975-06-19

1977-08-09

Kendall, Ralph S.

Metal treatment

Compositions

Heat treating

427226, 427228, 427249, 427253, 148 165, 148 635, C23C 1100

Patent

active

040408701

ABSTRACT:
A method of depositing a hard metal alloy is described wherein a volatile halide of titanium is reduced off the surface of a substrate and then reacted with a volatile halide of boron, carbon or silicon to effect the deposition on a substrate of an intermediate compound of titanium in a liquid phase. The liquid compound on the substrate is then reacted in the presence of hydrogen to produce a hard deposit containing titanium and boron, carbon or silicon. Also described are products which may be produced by the above method.

REFERENCES:
patent: 3499799 (1970-03-01), Patterson
patent: 3658577 (1972-04-01), Wakefield
patent: 3684585 (1972-08-01), Stroup et al.

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