Semiconductor device manufacturing: process – Bonding of plural semiconductor substrates
Reexamination Certificate
2006-07-11
2006-07-11
Dang, Phuc T. (Department: 2818)
Semiconductor device manufacturing: process
Bonding of plural semiconductor substrates
C438S464000
Reexamination Certificate
active
07074694
ABSTRACT:
To provide a high-precision deposition mask capable of vapor deposition on a large-sized deposition substrate in a vacuum deposition process, a method for readily manufacturing the deposition mask at low cost, an electroluminescent display unit, a method for manufacturing the unit, and an electronic apparatus including the electroluminescent display unit. A deposition mask has a configuration in which one or more mask chips each including a single crystal silicon substrate are joined to a mask support. The one or more mask chips are joined to respective predetermined sections of the mask support, the orientations of the one or more mask chips are arranged in such a manner that the crystal orientation of the single crystal silicon substrate is aligned in a predetermined direction, and the single crystal silicon substrate of each mask chip has openings.
REFERENCES:
patent: 5199055 (1993-03-01), Noguchi et al.
patent: 5783309 (1998-07-01), Faure et al.
patent: 6022462 (2000-02-01), Ikeda et al.
patent: 6459712 (2002-10-01), Tanaka et al.
patent: 6603159 (2003-08-01), Atobe et al.
patent: 6804323 (2004-10-01), Moriya et al.
patent: 6897126 (2005-05-01), Asano et al.
patent: 2002/0059903 (2002-05-01), Hasegawa et al.
patent: 2002/0111035 (2002-08-01), Atobe et al.
patent: 2003/0059690 (2003-03-01), Yotsuya
patent: 2003/0061593 (2003-03-01), Yotsuya
patent: 2003/0151118 (2003-08-01), Baude et al.
patent: 10 207044 (1998-08-01), None
patent: 2001-185350 (2001-07-01), None
patent: 2003-100460 (2003-04-01), None
patent: WO 03/069014 (2003-08-01), None
Communication from European Patent Office re: counterpart application.
Kuwahara Takayuki
Yotsuya Shinichi
Dang Phuc T.
Harness & Dickey & Pierce P.L.C.
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