Deposition chamber for deposition of particles on semiconductor

Details Deposition chamber for deposition of particles on semiconductor Deposition chamber for deposition of particles on semiconductor

1992-08-25

1994-04-26

Drodge, Joseph W.

Coating apparatus

Projection or spray type

With mask or stencil

118308, 118326, 118500, 118504, 427282, 269 21, 269903, 437225, B05B 1506

Patent

active

053063457

ABSTRACT:
A deposition chamber for forming a deposited layer on a wafer having a mixing chamber is disclosed having a wafer support device for supporting the wafers in the mixing chamber, a nozzle located above the wafer support device which can eject the gas/particle mixture into the mixing chamber toward the wafer, a gas outlet device at the bottom end of the chamber from the gas nozzle which allows the gas to exit the chamber and a deionizing device located above the wafer support device and below the nozzle to deionize the gas/particle mixture thereby encouraging uniform deposition of the particles on the wafer. This deposition chamber may also comprise an exhaust fan below the gas outlet device.

REFERENCES:
patent: 2239770 (1941-04-01), Becker et al.
patent: 3063867 (1962-11-01), Emery, Jr.
patent: 3499714 (1970-03-01), Schellenberg
patent: 3731650 (1973-05-01), Schweikert et al.
patent: 4375487 (1983-03-01), Huber
patent: 4397078 (1993-08-01), Imahashi
patent: 4544311 (1985-10-01), Husain
patent: 4547958 (1985-10-01), Hufford
patent: 4575922 (1986-03-01), Nemiroff
patent: 4599558 (1986-07-01), Castellano, Jr. et al.
patent: 4605893 (1986-08-01), Braslau
patent: 4676193 (1987-06-01), Martin
patent: 4825809 (1989-05-01), Mieno
patent: 4962727 (1990-10-01), Harada
patent: 4989541 (1991-02-01), Mikoshiba et al.
patent: 5035750 (1991-07-01), Tada et al.
patent: 5042421 (1991-08-01), Anbe
patent: 5042423 (1991-08-01), Wilkinson
patent: 5180435 (1993-01-01), Markunas et al.
patent: 5194297 (1993-03-01), Scheer et al.
Georg Schurmann, "Measurement Techniques for Hepa-Filters in the Range from 0.03 Micrometers-1 Micrometer.", undated.
David Y. H. Pui and Benjamin Y. H. Liu, "Aerosol Generation and Calibration of Instruments," TSI Quarterly, vol. V, No. 2, May/Jun. 1979, pp. 5-12 undated.
Benjamin Y. H. Liu and K. W. Lee, "An Aerosol Generator of High Stability," American Industrial Hygiene Assoc. Journal, Dec. 1975, pp. 861-865, undated.
Jugal K. Agarwal and Gilmore J. Sem, "Generating Submicron Monodisperse Aerosols for Instrument Calibration", TSI Quarterly, vol. IV, No. 2, May/Jun. 1978, pp. 3-8.
B. R. Locke and R. P. Donovan, "Particle Sizing Uncertainties in Laser Scanning of Silicon Wafers (Calibration/Evaluation of the Aeronca Wafer Inspection System 150)" undated.
Japanese study (2 pages) undated.

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