Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Patent
1996-09-16
1998-08-04
Achutamurthy, Ponnathapura
Cleaning and liquid contact with solids
Processes
Including application of electrical radiant or wave energy...
134 2, 134 31, 134 37, 134 21, 156345, 1566431, 1566461, 1566571, B08B 704, B08B 500, C03C 2306, C03C 1500
Patent
active
057887780
ABSTRACT:
A method for cleaning a deposition chamber that is used in fabricating electronic devices including the steps of delivering a precursor gas into a remote chamber that is outside of the deposition chamber, activating the precursor gas in the remote chamber via a high power source to form a reactive species, flowing the reactive species from the remote chamber into the deposition chamber, and using the reactive species that is flowed into the deposition chamber from the remote chamber to clean the inside of the deposition chamber.
Law Kam S.
Maydan Dan
Shang Quanyuan
Achutamurthy Ponnathapura
Applied Komatsu Technology Inc.
Ponnaluri Padmashri
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