Deposition chamber cleaning technique using a high power remote

Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...

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134 2, 134 31, 134 37, 134 21, 156345, 1566431, 1566461, 1566571, B08B 704, B08B 500, C03C 2306, C03C 1500

Patent

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057887780

ABSTRACT:
A method for cleaning a deposition chamber that is used in fabricating electronic devices including the steps of delivering a precursor gas into a remote chamber that is outside of the deposition chamber, activating the precursor gas in the remote chamber via a high power source to form a reactive species, flowing the reactive species from the remote chamber into the deposition chamber, and using the reactive species that is flowed into the deposition chamber from the remote chamber to clean the inside of the deposition chamber.

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