Deposition and hardening of titanium gate electrode material for

Metal working – Method of mechanical manufacture – Assembling or joining

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

29591, 148DIG131, 357 237, 156643, H01L 2978

Patent

active

046464247

ABSTRACT:
The gate electrode in an inverted field effect transistor (FET) is fabricated with titanium to provide an FET which is particularly suitable for use as the switching element in a matrix addressed liquid crystal display. More particularly, the resist employed in gate electrode patterning is plasma ashed in an oxygen atmosphere to toughen the titanium gate material and render it more amenable to subsequent processing steps.

REFERENCES:
patent: Re30505 (1981-02-01), Jacob
patent: 3514676 (1970-05-01), Fa
patent: 3806365 (1974-04-01), Jacob
patent: 4333965 (1982-06-01), Chow et al.
patent: 4558340 (1985-12-01), Schohter et al.
Colclaser, Microelectronics Processing and Device Design, John Wiley and Sons, New York, 1980, pp. 44-45, 79-83 and 108-109.
"Silicon TFTs for Flat Panel Displays", by F. Morin and M. LeContellec, Hewlett Packard Journal, (date unknown).
"Amorphous-Silicon Thin-Film Metal-Oxide-Semiconductor Transistors", by Hiroshi Hayama and Masakiyo Matsumura, Applied Physics Letters, vol. 36, No. 9 (May 1980).
"Amorphous Silicon-Silicon Nitride Thin-Film Transistors", by M. J. Powel et al., Applied Physics Letters, vol. 38, No. 10 (May 1981).
"Application of Amorphous Silicon Field Effect Transistors in Addressable Liquid Crystal Display Panels", by A. J. Snell et al., Applied Physics, vol. 24, pp. 357-362 (1981).
"A TFT-Addressed Liquid Crystal Color Display", by M. Sugata et al. (Oct. 1983), Proceedings of the Third International Display Research Conference, Paper No. 53.
"Amorphous-Silicon TFT Array for LCD Addressing", by M. V. C. Stroomer, Electronic Letters, vol. 18, No. 20 (1982).
"High Resolution Transparent-Type a-Si TFT LDCs", by K. Suzuki et al., SID Digest, (1983).
"Promise and Challenge of Thin-Film Silicon Approaches to Active Matrices", by A. I. Lakatos, 1982 International Display Research Conference, IEEE, pp. 146-151.
"Application of Amorphous Silicon Field Effect Transistors in Integrated Circuits", by A. J. Snell et al., Applied Physics, vol. A26, pp. 83-86.
Rand, M., "Plasma-Promoted Deposition of Thin Inorganic Films", J. Vac. Sci. Technol., vol. 16(2), pp. 420-427.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Deposition and hardening of titanium gate electrode material for does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Deposition and hardening of titanium gate electrode material for, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Deposition and hardening of titanium gate electrode material for will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1009321

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.