Deposited films with improved microstructures

Details Deposited films with improved microstructures Deposited films with improved microstructures

1982-02-22

1984-08-28

Padgett, Benjamin R.

Stock material or miscellaneous articles

All metal or with adjacent metals

Having metal particles

428938, 204192R, 204192EC, 4272555, 4272557, 427270, 427271, B22F 708, C23C 1300

Patent

active

044684371

ABSTRACT:
Methods for improving microstructures of line-of-sight deposited films are described. Columnar growth defects ordinarily produced by geometrical shadowing during deposition of such films are eliminated without resorting to post-deposition thermal or mechanical treatments. The native, as-deposited coating qualities, including homogeneity, fine grain size, and high coating-to-substrate adherence, can thus be retained. The preferred method includes the steps of emitting material from a source toward a substrate to deposit a coating non-uniformly on the substrate surface, removing a portion of the coating uniformly over the surface, again depositing material onto the surface, but from a different direction, and repeating the foregoing steps. The quality of line-of-sight deposited films such as those produced by sputtering, progressively deteriorates as the angle of incidence between the flux and the surface becomes increasingly acute. Depositing non-uniformly, so that the coating becomes progressively thinner as quality deteriorates, followed by uniformly removing some of the coating, such as by resputtering, eliminates the poor quality portions, leaving only high quality portions of the coating. Subsequently sputtering from a different direction applies a high quality coating to other regions of the surface. Such steps can be performed either simultaneously or sequentially to apply coatings of a uniformly high quality, closed microstructure to three-dimensional or large planar surfaces.

REFERENCES:
patent: 3021271 (1962-02-01), Wehner
patent: 3736242 (1973-05-01), Schwartz et al.
patent: 4006070 (1977-02-01), King et al.
patent: 4036723 (1977-07-01), Schwartz et al.
patent: 4038171 (1977-07-01), Moss et al.
patent: 4150905 (1979-04-01), Kaplan
Patten et al., "Recent Developments in the Application of High Rate Sputtering Technology . . . " Paper 64, 1977 Tokyo Joint Gas Turbine Congress pp. 1-11..
McClanahan et al. "Initial Work on the Application of Protective Coatings . . . " ASME Gas Turbine Division Paper 74-GT-100, Mar. 1974.

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