Deposited film forming process and deposited film forming device

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

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427 34, 427 541, 427 531, 427233, 427234, 118719, 118720, B05D 306, B05D 512, C23C 1600

Patent

active

048492493

ABSTRACT:
A process for forming a deposited film according to chemical vapor deposition on a substrate comprises the first step of forming an amorphous film by reacting an excited species (AY) containing an atom (A) which becomes the constituent constituting said deposited film and an atom (Y) with high electronegativity with an active species (Z) which is chemically reactive with said excited species (AY) at a first ratio and the second step of forming a polycrystalline film by reacting said excited species (AY) with said active species (Z) at a second ratio which is different from said first ratio.

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