Deposited film forming apparatus and electrode for use in it

Details Deposited film forming apparatus and electrode for use in it Deposited film forming apparatus and electrode for use in it

1995-12-22

1999-10-05

Tsang, Cecilia J.

Coating apparatus

Gas or vapor deposition

With treating means

118723ME, 118723MP, 118723MW, 118730, C23C 1600

Patent

active

059617268

ABSTRACT:
The deposited film forming apparatus of the present invention capable of forming a deposited film having a small number of structural defects and a light-receiving member for electrophotography for forming a light-receiving member for electrophotography having excellent image characteristics, which comprises means for supplying a source gas into a reaction vessel capable of reducing a pressure in which said substrate is arranged, and high-frequency power supply means for supplying a high-frequency power into said reaction vessel in which said substrate is arranged, the source gas being decomposed by the high-frequency power to be able to form a deposited film on the substrate, wherein a supply portion of said high-frequency power supply means is constituted by a plurality of members.

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