Deposited film forming apparatus and deposited film forming...

Coating processes – Immersion or partial immersion – Running lengths

Reexamination Certificate

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C427S569000, C427S580000, C118S718000, C118S7230ER, C156S345470

Reexamination Certificate

active

06855377

ABSTRACT:
A deposited film forming apparatus has a power applying electrode disposed above a flat plate type base member grounded, in a vacuum chamber, and a power source for supplying a power to the power applying electrode, the deposited film forming apparatus being constructed to supply the power from the power source to the power applying electrode so as to generate a plasma in a discharge space between the power applying electrode and a substrate disposed in opposition to the power applying electrode in the vacuum chamber and serving as an electrode in a pair with the power applying electrode, thereby decomposing a source gas introduced into the vacuum chamber to form a deposited film on the substrate, wherein the power applying electrode is fixed to the base member with the power applying electrode being isolated from the base member.

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patent: 63-003338 (1988-10-01), None
patent: 5-56850 (1993-08-01), None
patent: 9-235676 (1997-09-01), None
patent: 2001-288575 (2001-10-01), None

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