Deposited film forming apparatus

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means

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118723R, 118724, C23F 102

Patent

active

061137324

ABSTRACT:
A deposit film forming apparatus is characterized in that a temperature control member for controlling the temperature of a wall of deposition chamber is in contact with an outer wall of a deposition chamber through a heat conductivity adjusting plate, which can prevent overcooling while suppressing an increase in the temperature of the wall of deposition chamber during film formation and which can maintain the temperature of the wall of deposition chamber at a preferable temperature for deposition of film for a long time, thereby forming a deposit film. As a result, the apparatus can mass-produce deposit films of stable quality, especially, large-area and good-quality photovoltaic elements utilizing amorphous semiconductors, over a long period.

REFERENCES:
patent: 3926715 (1975-12-01), Sussmann
patent: 4399016 (1983-08-01), Tsukada et al.
patent: 5345999 (1994-09-01), Hosokawa
patent: 5453125 (1995-09-01), Kruga
patent: 5580822 (1996-12-01), Hayakawa et al.
patent: 5660740 (1997-08-01), Komino
patent: 5680428 (1997-10-01), Amemiya et al.

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