Deposited film formation method utilizing selective deposition b

Details Deposited film formation method utilizing selective deposition b Deposited film formation method utilizing selective deposition b

1992-10-30

1995-02-28

Breneman, R. Bruce

Fishing, trapping, and vermin destroying

437199, 427124, 427252, 427535, 427563, 427576, H01L 2144

Patent

active

053936990

ABSTRACT:
By providing a deposited film formation method in which aluminum or a metal composed mainly of aluminum of good quality is selectively deposited according to the CVD method utilizing an alkyl aluminum hydride and hydrogen, and then pure aluminum or a metal composed mainly of aluminum is non-selectively deposited, it becomes possible to form an electroconductive film of good quality within fine openings or on an insulating layer.

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