Depletion mode thin film semiconductor photodetectors

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

357 4, 357 2314, 357 24, 357 30, H01L 2978, H01L 2712

Patent

active

045983054

ABSTRACT:
A depletion mode thin film semiconductor photodetector comprises a crystalline silicon thin film on an insulating substrate with a source region, a drain region and a thin film light sensing channel region formed therebetween. A gate oxide formed over the channel region and a gate electrode formed on the gate oxide. A p-n junction located parallel to the surface of the substrate and within the thin film functioning as a space charge separation region in the channel. The lower portion of the channel region is a p region extending to the substrate and the upper portion of the channel region is a n region extending to the gate oxide. The channel region functions as a fully depleted channel when the photodetector is operated in its OFF state providing for high dynamic range and large photocurrent operation. The depletion mode thin film semiconductor photodetector with n.sup.+ source and drain regions function as an ohmic contacts to the channel n region forming a thin film transistor. The thin film transistor photodetector has high photoconductive gain at low light intensities when the n channel region is fully pinched off by an applied gate voltage to the gate electrode which is sufficiently negative as compared to the threshold voltage of the photodetector. When the drain region is replaced by a p.sup.+ region functioning as an ohmic contact to the channel p region, a depletion mode gated diode is formed. When the channel region is extended to include a plurality of linearly spaced gate electrodes formed on the gate oxide region with an input diode formed adjacent to the first of such gate electrodes and an output diode formed adjacent to the last of such gate electrodes, the photodetector functions as a charge coupled device.

REFERENCES:
patent: 3704376 (1972-11-01), Lehovic
patent: 3735156 (1973-05-01), Krambeck
patent: 4065781 (1977-12-01), Gutknecht
patent: 4330363 (1982-05-01), Biegelsen et al.
patent: 4409724 (1983-10-01), Tasch, Jr. et al.
patent: 4419696 (1983-12-01), Hamano et al.
A. Chiang et al., "NMOS Logic Circuits in Laser Crystallized Silicon on Quartz", Energy Beam-Solid Interactions & Transient Thermal Processing, MRS Proceedings, vol. 23, pp. 551-558 (Elsevier, 1984).
N. M. Johnson et al., "Processing & Properties of CW Laser-Recrystallized Silicon Films on Amorphous Substrates", Laser & Electron Beam Solid Interactions & Materials Processing, MRS Proceedings, vol. 1, pp. 463-470 (Elsevier, 1981).
Fennell et al., "Defect Reduction by Titled Zone Crystallization of Patterned Silicon Films on Fused Silica", Energy Beam-Solid Interactions & Transient Thermal Processing, MRS Proceedings, vol. 23, pp. 403-408 (Elsevier, 1984).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Depletion mode thin film semiconductor photodetectors does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Depletion mode thin film semiconductor photodetectors, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Depletion mode thin film semiconductor photodetectors will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1084830

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.