Depletion compartment for deionization apparatus and method

Details Depletion compartment for deionization apparatus and method Depletion compartment for deionization apparatus and method

1987-11-25

1989-02-14

Niebling, John F.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

2041824, 2041825, B01D 1302

Patent

active

048044512

ABSTRACT:
A depletion compartment for a deionization apparatus is provided. The depletion compartment includes a spacer containing longitudinal ribs that divide an open central section of the spacer into subcompartments, an anion permeable membrane and a cation permeable membrane. Each membrane is formed from an ion permeable resin supported on an ion permeable support. Each membrane is skived at the point of bonding of the membranes of the spacer so that the support portion of the membranes is bonded directly to the spacer.

REFERENCES:
patent: 2867575 (1959-01-01), De Jong
patent: 3359194 (1967-12-01), Kollsmar
patent: 3412006 (1968-11-01), Alexander et al.
patent: 3488276 (1970-01-01), Tarsey
patent: 4197206 (1980-04-01), Karn
patent: 4217200 (1980-08-01), Kedem et al.
patent: 4569747 (1986-02-01), Kedem et al.
patent: 4632745 (1986-12-01), Giuffrida et al.

Affiliated with

Also associated with

Rating

Depletion compartment for deionization apparatus and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Depletion compartment for deionization apparatus and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Depletion compartment for deionization apparatus and method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1363949