Depilatory compositions comprising sulfhydryl compounds

Details Depilatory compositions comprising sulfhydryl compounds Depilatory compositions comprising sulfhydryl compounds

1997-04-09

1999-04-27

Nutter, Nathan M.

Drug, bio-affecting and body treating compositions

Inorganic active ingredient containing

Elemental sulfur or compound thereof

424708, 81283, 8 9416, 8161, 514706, A61K 715, A61K 706, A61K 31095

Patent

active

058978577

ABSTRACT:
The subject invention involves topical depilatory composition at a pH 7 or below, comprising sulfhydryl compounds. The subject invention further relates methods for removing vellus hair from mammalian comprising topical application of a composition, at a pH of 7 or below, comprising a sulfhydryl compound or a cosmetically- and/or pharmaceutically-acceptable salt thereof.

REFERENCES:
patent: 3242052 (1966-03-01), Sheffner
patent: 3865546 (1975-02-01), Zemlin et al.
patent: 4195095 (1980-03-01), Sheffner
patent: 4411886 (1983-10-01), Hostettler et al.
patent: 4618344 (1986-10-01), Wells
patent: 4631064 (1986-12-01), Juneja
patent: 4919924 (1990-04-01), Pigiet
patent: 4935231 (1990-06-01), Pigiet
patent: 5095007 (1992-03-01), Ahluwalia
patent: 5296500 (1994-03-01), Hillebrand
patent: 5362748 (1994-11-01), Schwen et al.
patent: 5411991 (1995-05-01), Shander et al.
Summary of Clinical Studies: 3-Patch Human Skin Irritation Test; The Procter & Gamble Co.; Jun., 1992.
Human Skin Sensitization Study; The Procter & Gamble Co.; Jul., 1992-May, 1993.
Human Photoirritation/Phototoxicity Study; The Procter & Gamble Co.; Aug., 1992-Sep., 1992.
Human Photosensitization; The Procter & Gamble Co.; Sep., 1992-Jan., 1993.
Human Facial Moisturizer Split Face Irritation Study; The Protecter & Gamble Co.; Nov., 1992.
Randomized, Vehicle-Controlled, Double-Blind Study to Examine Effects of Topically Applied NAC on Photodamaged Wrinkled Human Facial Skin; The Procter & Gamble Co.; Jun., 1993-Dec., 1993.

Affiliated with

Also associated with

Rating

Depilatory compositions comprising sulfhydryl compounds does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Depilatory compositions comprising sulfhydryl compounds, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Depilatory compositions comprising sulfhydryl compounds will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-684633