X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2005-07-19
2005-07-19
Church, Craig E. (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
Reexamination Certificate
active
06920200
ABSTRACT:
Provided is a novel density-nonuniform multilayer analyzing method that readily and highly accurately enables analyzing the state of distribution and interfacial condition of particulate matter in a density-nonuniform multilayer film. The method includes the step of, by using a scattering function representing an X-ray scattering curve according to a fitting parameter indicating a state of distribution of particulate matter, calculating a simulated X-ray scattering curve under the same conditions as those under which an actually measured X-ray scattering curve is measured, and the step of performing fitting between the simulated X-ray scattering curve and the actually measured X-ray scattering curve while the fitting parameter is being changed. The values of the fitting parameters that have been used when the simulated X-ray scattering curve and the actually measured X-ray scattering curve have coincided with each other are regarded as representing the state of distribution of the particulate matter in the density-nonuniform multilayer film. By doing so, there is analyzed the state of distribution of the particulate matter within the density-nonuniform multilayer film. In this case, as the scattering function, there is used a function into which there has been introduced the transition probability wherein the exact solutions of the multilayer film where no scattering occurs at the interfaces are set to be an initial state and a final state.
REFERENCES:
patent: 4641030 (1987-02-01), Regimand
patent: 6421415 (2002-07-01), Peczkis et al.
Ito Yoshiyasu
Omote Kazuhiko
Artman Thomas R
Church Craig E.
Rigaku Corporation
Wenderoth , Lind & Ponack, L.L.P.
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