Dense phase gas photochemical process for substrate treatment

Details Dense phase gas photochemical process for substrate treatment Dense phase gas photochemical process for substrate treatment

1989-04-03

1991-11-26

Wyse, Thomas

Liquid purification or separation

Processes

Utilizing electrical or wave energy directly applied to...

210760, 134 1, 134 31, C02F 132, C02F 178, B08B 312

Patent

active

050680404

ABSTRACT:
A process for removing undesired material from a chosen substrate by exposing the substrate simultaneously to ultraviolet radiation and a selected dense fluid, wherein the radiation produces a photochemical reaction that removes the undesired material from the substrate and the dense fluid enhances the removal of the undesired material. In an alternative embodiment, a reactive agent may additionally be used. The process may be used to remove contaminants from a substrate, etch a substrate surface, or destroy toxic organic material in industrial wastes.

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patent: 4260484 (1981-04-01), Connolly
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patent: 4289594 (1981-09-01), Alpaugh et al.
patent: 4437999 (1984-03-01), Mayne
patent: 4640782 (1987-02-01), Burleson
patent: 4735728 (1988-04-01), Wemhoff
patent: 4793931 (1988-12-01), Stevens et al.

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