Dense fluid photochemical process for substrate treatment

Details Dense fluid photochemical process for substrate treatment Dense fluid photochemical process for substrate treatment

1991-01-22

1993-06-01

Morris, Theodore

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

134 10, 210748, B08B 312, B01D 1706

Patent

active

052155927

ABSTRACT:
A process for removing undesired material from a chosen substrate by exposing the substrate simultaneously to ultraviolet radiation and a selected dense fluid, wherein the radiation produces a photochemical reaction that removes the undesired material from the substrate and the dense fluid enhances the removal of the undesired material. In an alternative embodiment, a reactive agent may additionally be used. The process may be used to remove contaminants from a substrate, etch a substrate surface, or destroy toxic organic material in industrial wastes.

REFERENCES:
patent: 4289594 (1981-09-01), Alpaugh et al.
patent: 4437999 (1984-03-01), Mayne
patent: 4541913 (1985-09-01), Urquhart et al.
patent: 4568447 (1986-02-01), Pujado et al.
patent: 4675101 (1987-06-01), Warzinski
patent: 4885047 (1989-12-01), Ury et al.

Affiliated with

Also associated with

Rating

Dense fluid photochemical process for substrate treatment does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Dense fluid photochemical process for substrate treatment, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dense fluid photochemical process for substrate treatment will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1811775