Dense fluid photochemical process for liquid substrate treatment

Details Dense fluid photochemical process for liquid substrate treatment Dense fluid photochemical process for liquid substrate treatment

1991-01-28

1993-08-17

Wyse, Thomas

Liquid purification or separation

Processes

Utilizing electrical or wave energy directly applied to...

210760, 210761, 210908, C02F 132, C02F 178

Patent

active

052366022

ABSTRACT:
A process for removing undesired material from a chosen substrate by exposing the substrate simultaneously to ultraviolet radiation and a selected dense fluid, wherein the radiation produces a photochemical reaction that removes the undesired material from the substrate and the dense fluid enhances the removal of the undesired material. In an alternative embodiment, a reactive agent may additionally be used. The process may be used to remove contaminants from a substrate, etch a substrate surface, or destroy toxic organic material in industrial wastes.

REFERENCES:
patent: 4347144 (1982-08-01), Bodenbenner et al.
patent: 4543190 (1985-09-01), Modell
patent: 4654144 (1987-03-01), Sharkey et al.
patent: 4751005 (1988-06-01), Mitsui et al.
patent: 4849114 (1989-07-01), Zeff et al.
patent: 4956098 (1990-09-01), Stevens et al.

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