Dense coating formation by reactive deposition

Details Dense coating formation by reactive deposition Dense coating formation by reactive deposition

2004-12-20

2009-02-17

Padgett, Marianne L (Department: 1792)

Coating processes

Direct application of electrical, magnetic, wave, or...

Photoinitiated chemical vapor deposition

C427S583000, C427S584000, C427S586000, C427S597000

Reexamination Certificate

active

07491431

ABSTRACT:
Methods for forming coated substrates can be based on depositing material from a flow onto a substrate in which the coating material is formed by a reaction within the flow. In some embodiments, the product materials are formed in a reaction driven by photon energy absorbed from a radiation beam. In additional or alternative embodiments, the flow with the product stream is directed at the substrate. The substrate may be moved relative to the flow. Coating materials can be formed with densities of 65 percent to 95 percent of the fully densified coating material with a very high level of coating uniformity.

REFERENCES:
patent: 3806570 (1974-04-01), Flamenbaum et al.
patent: 3883336 (1975-05-01), Randall
patent: 3923484 (1975-12-01), Randall
patent: 3932162 (1976-01-01), Blankenship
patent: 3934061 (1976-01-01), Keck et al.
patent: 4011067 (1977-03-01), Carey, Jr.
patent: 4038370 (1977-07-01), Tokimoto et al.
patent: 4113844 (1978-09-01), Tokimoto et al.
patent: 4119509 (1978-10-01), Szoke
patent: 4140912 (1979-02-01), Bressan et al.
patent: 4581248 (1986-04-01), Roche
patent: 4681640 (1987-07-01), Stanley
patent: 4735677 (1988-04-01), Kawachi et al.
patent: 4782787 (1988-11-01), Roche
patent: 4814289 (1989-03-01), Baeuerle
patent: 4868005 (1989-09-01), Ehrlich et al.
patent: 4986214 (1991-01-01), Zumoto et al.
patent: 5043548 (1991-08-01), Whitney
patent: 5060595 (1991-10-01), Ziv et al.
patent: 5085166 (1992-02-01), Oka et al.
patent: 5108952 (1992-04-01), Matsuhashi
patent: 5174826 (1992-12-01), Mannava et al.
patent: 5246745 (1993-09-01), Baum et al.
patent: 5276012 (1994-01-01), Ushida et al.
patent: 5306447 (1994-04-01), Marcus et al.
patent: 5328514 (1994-07-01), Inoue et al.
patent: 5385594 (1995-01-01), Kanamori et al.
patent: 5514350 (1996-05-01), Kear et al.
patent: 5547716 (1996-08-01), Thaler
patent: 5551966 (1996-09-01), Hirose et al.
patent: 5556442 (1996-09-01), Kanamori et al.
patent: 5622750 (1997-04-01), Kilian et al.
patent: 5652021 (1997-07-01), Hunt et al.
patent: 5744777 (1998-04-01), Bernecki et al.
patent: 5770126 (1998-06-01), Singh et al.
patent: 5858465 (1999-01-01), Hunt et al.
patent: 5863604 (1999-01-01), Hunt et al.
patent: 5874134 (1999-02-01), Rao et al.
patent: 5885904 (1999-03-01), Mehta et al.
patent: 5938979 (1999-08-01), Kambe et al.
patent: 5958348 (1999-09-01), Bi et al.
patent: 5997956 (1999-12-01), Hunt et al.
patent: 6011981 (2000-01-01), Alvarez et al.
patent: 6013318 (2000-01-01), Hunt et al.
patent: 6032871 (2000-03-01), Borner et al.
patent: 6074888 (2000-06-01), Tran et al.
patent: 6097144 (2000-08-01), Lehman
patent: 6254928 (2001-07-01), Doan
patent: 6280802 (2001-08-01), Akedo et al.
patent: 7108894 (2006-09-01), Renn
patent: 7311947 (2007-12-01), Dando et al.
patent: 2002/0179564 (2002-12-01), Geobegan et al.
patent: 2003/0228415 (2003-12-01), Bi et al.
patent: 2185494 (1987-07-01), None
patent: 02088775 (1990-03-01), None
patent: 5313221 (1993-11-01), None
patent: 6116743 (1994-04-01), None
patent: 10-280152 (1998-10-01), None
patent: 2000-212766 (2000-08-01), None
patent: WO 99/23189 (1999-05-01), None
patent: WO 99/61244 (1999-12-01), None
patent: WO 00/26151 (2000-05-01), None
patent: WO 02/32588 (2002-04-01), None
Barbarossa et al., “Effect of temperature gradient on sintering kinetics of doped silica waveguides by flame hydrolysis deposition”, SPIE vol. 1794 Integrated Optical Circuits II, pp. 191-197, 1992, no month.
Barbarossa et al., “High-silica cascaded three-waveguide couplers for wideband filtering by Flam Hydrolysis on Si”, SPIE vol. 1583 Integrated Optical Circuits, pp. 122-128, 1991, no month.
Barbarossa et al., “Optical damage threshold of P2O5and GeO2-P2O5-doped silica waveguides”, SPIE vol. 1794 Integrated Optical Circuits II, pp. 185-190, 1992, no month.
Barbarossa et al., “High-silica low-loss three waveguide couplers on Si by Flame Hydrolysis Deposition”, SPIE vol. 1513 Glasses for Optoelectronics II, pp. 37-43, 1991, no month.
Besling et al., Laser-Induced Chemical Vapor Deposition of Nanostructured Silicon Carbonitride Thin Films, pp. 544-553, Laboratory for Applied Inorganic Chemistry, Delft University of Technology, Julianalaan 136, 2628 BL Delft, The Netherlands. J. Appl. Phys.83(1), Jan. 1, 1998.
Bilenchi et al., CO2Laser-Assisted Deposition of Boron and Phosphorus-Doped Hydrogenated Amorphous Silicon, American Institute of Physics 1985, pp. 279-281, Appl. Phys. Lett.47(3) Aug. 1.
Bilenchi et al., Hydrogenated Amorphous Silicon Growth by CO2Laser Photodissociation of Silane, American Institute of Physics 1982, pp. 6479-6481, J.Appl.Phys.53(9) September.
Bornard et al., LiNbO3Thin Films Deposited on Si Substrates: a Morphological Development Study, Materials Chemistry and Physics, pp. 571-577, Elsevier Science B.V. 2002, no month vol. 77.
Center for Nano Particle Control, Website Mansoo CHOI, Associate Professor of Mechanized Engineering, Seoul National University, Jun. 2000.
Ichinose et al., Deposition of LaMO3(M=Co, Cr, Al) Films by Spray Pyrolysis in Inductively Coupled Plasma, Journal of Crystal Growth, pp. 59-64, Elsevier Science B.V. 1994, no month.
Ichinose et al., Deposition of LaMO3(M=Co, Cr, Al)-Oriented Films by Spray Combustion Flame Technique, Jpn. J. Appl. Phys. vol. 33 (1994), pp. 5907-5910, part 1,No. 10 October.
Jervis, Metal Film Deposition by Gas-Phase Laser Pyrolysis of Nickel Tetracarbonyl, American Institute of Physics 1985, pp. 1400-1401, J.Appl.Phys.58(3) , Aug. 1.
Kim et al., Deposition of MgO Thin Films by Modified Electrostatic Spray Pyrolysis Method, Thin Solid Films 376 (2000), pp. 110-114, Elsevier Science S.A. 2000, no month.
Lebedev et al., “Laser distillation-deposition synthesis of silica glasses with variable concentrations of oxygen deficient centers”, SPIE vol. 2498, pp. 65-71, 1995, no month.
Liang et al., “Laser synthesize silicon-based and ferro-based nano powders”, SPIE vol. 3862, pp. 17-21, 1999, no month.
Magee et al., Laser-Induced Conversion of Molecular Precursors to Thin Films and Deposited Layers, American Chemical Society 1990, pp. 232-235, Chem.Mater. vol. 2, no month.
Maric et al., Electrolyte Materials for Intermediate Temperature Fuel Cells Produced via Combustion Chemical Vapor Condensation, Electrochemical and Solid-State Letters, 6(5) 2003, pp. A91-A95, no month.
Maxwell, “Photosensitivity & rare-earth doping in flame hydrolysis deposited planar silica waveguides”, SPIE vol. 2695, pp. 16-29, 1996, no month.
Meunier et al., Hydrogenated Amorphous Silicon Produced by Laser Induced Chemical Vapor Deposition of Silane, American Institute of Physics 1983, pp. 273-275, Appl.Phys.Lett.43(3) Aug. 1.
Meunier et al., Laser-Induced Chemical Vapor Deposition of Hydrogenated Amorphous Silicon. I. Gas-Phase Process Model, American Institute of Physics 1987, pp. 2812-2821, J.Appl.Phys.62(7),Oct. 1, 1987.
Meunier et al., Laser-Induced Chemical Vapor Deposition of Hydrogenated Silicon II. Film Properties, American Institute of Physics 1987, pp. 2822-2829, J.Appl. Phys. 62(7) Oct. 1, 1987.
Oljaca et al., Deposition of BaxSr1-xTiO3in Atmospheric Pressure Flame: Combustion Monitoring and Optimization of Thin Film Properties, Surface Engineering, vol. 19, No. 1, 2003, pp. 51-57, no month.
Rabii et al., “Recent advances in the fabrication of hollow glass waveguides”, SPIE vol. 3262, pp. 103-107, 1998, no month.
Sun et al., “Building passive components with silica waveguides”, SPIE vol. 3795, pp. 313-319, 1999, July.
Vukasinovic et al., Closed Loop Controlled Deposition of BaxSr1-xTiO3Thin Films in Spray Flames, Surface Engineering, vol. 19, No. 3, 2003, pp. 179-184, no month.
“A New Ceramic Coating Technique for SOFC Using the ETL Laser Spraying Process”, Tsukamoto, et al., Solid State Ionics, 40/41 (1990), 1003-1006, no month.

Affiliated with

Also associated with

Rating

Dense coating formation by reactive deposition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Dense coating formation by reactive deposition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dense coating formation by reactive deposition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4091006