Degassing apparatus

Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – Organic polymerization

Reexamination Certificate

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Details

C422S232000, C422S238000, C096S376000, C055S482000, C095S037000, C095S285000, C095S287000

Reexamination Certificate

active

10311619

ABSTRACT:
A degassing apparatus for use with a polymerisation reactor is disclosed. Slurry from the reactor is discharged into a flask tank (3) in which monomers or dilluent vaporise to form a gas. Filler units (9, 10) are provided at the upper part of the flash tank (3). They may be selectively connected to the flash tank by valves (11, 12). No cyclone etc. is provided between the flash tank and the filter (9, 10) and these particles may then fall back into the flash tank (3). The filters may be separately isolated for cleaning or replacement.

REFERENCES:
patent: 3541764 (1970-11-01), Astrom
patent: 3941664 (1976-03-01), Scoggin
patent: 4395523 (1983-07-01), Kirch
patent: 4620024 (1986-10-01), Davis et al.
patent: 4855524 (1989-08-01), Harandi et al.
patent: 4923068 (1990-05-01), Crowson
patent: 4953694 (1990-09-01), Hayashi et al.
patent: 5994147 (1999-11-01), Rodriguez et al.
patent: 6045661 (2000-04-01), Kreischer et al.
patent: 6262294 (2001-07-01), Sako et al.
patent: 6566460 (2003-05-01), Salmon
patent: 226216 (1987-06-01), None
patent: 874 802 (1961-08-01), None
patent: 5953507 (1984-03-01), None
patent: WO93/13845 (1993-07-01), None
patent: WO99/16540 (1999-04-01), None

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