Deflector of a micro-column electron beam apparatus and...

Details Deflector of a micro-column electron beam apparatus and... Deflector of a micro-column electron beam apparatus and...

2007-05-08

2007-05-08

Nguyen, Kiet T. (Department: 2881)

Electric lamp or space discharge component or device manufacturi

Process

With assembly or disassembly

C445S050000, C438S020000

Reexamination Certificate

active

10853519

ABSTRACT:
The present invention relates to a deflector of a micro-column electron beam apparatus and method for fabricating the same, which forms a seed metal layer and a mask layer on both sides of a substrate, and exposes some of the seed metal layer on which deflecting plates, wirings and pads are to be formed by lithography process using a predetermined mask. The wirings and pads are formed by plating metal on the exposed portion, and some of the metal layer is also exposed on which the deflecting plates are to be formed using a predetermined mask, and then the metal is plated with desired thickness, thereby the deflecting plates are completed. Therefore, by forming plurality of deflecting plates on both sides of the substrate at the same time through plating process, alignment between the deflecting plates formed on both sides of the substrate can be exactly made, and by fabricating a deflector integrated with the substrate and deflecting plates in a batch process, productivity and reproducibility is improved. In addition, since the deflecting plates, wirings and pads are directly formed on the substrate, structural safety is improved and thereby durability is also improved.

REFERENCES:
patent: 6797963 (2004-09-01), Choi et al.
patent: 2001-51486 (2001-06-01), None
L. P. Muray, et al.; “Advances in arrayed microcolumn lithography”; J. Vac. Sci. Technol. B 18(6) ; Nov./Dec. 2000; American Vacuum Society; pp. 3099-3103.

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