Radiant energy – With charged particle beam deflection or focussing – Magnetic lens
Reexamination Certificate
2005-10-11
2005-10-11
Lee, John R. (Department: 2881)
Radiant energy
With charged particle beam deflection or focussing
Magnetic lens
C250S492200
Reexamination Certificate
active
06953938
ABSTRACT:
A deflector which deflects a charged particle beam includes a substrate having an opening through which the charged particle beam should pass, and a deflection electrode which is arranged in the opening to deflect the charged particle beam and has a first conductive member and second conductive member, which are formed by plating. The second conductive member is formed on the surface of the first conductive member and is made of a material that is more difficult to oxidize than the first conductive member. The first conductive member is made of a material having smaller residual stress than the second conductive member.
REFERENCES:
patent: 5864142 (1999-01-01), Muraki et al.
patent: 5905267 (1999-05-01), Muraki
patent: 5929454 (1999-07-01), Muraki et al.
patent: 5939725 (1999-08-01), Muraki
patent: 5981954 (1999-11-01), Muraki
patent: 6054713 (2000-04-01), Miyake et al.
patent: 6104035 (2000-08-01), Muraki
patent: 6107636 (2000-08-01), Muraki
patent: 6124599 (2000-09-01), Muraki
patent: 6125522 (2000-10-01), Nakasuji
patent: 6137113 (2000-10-01), Muraki
patent: 6392243 (2002-05-01), Muraki
patent: 6465783 (2002-10-01), Nakasuji
patent: 6466301 (2002-10-01), Yui et al.
patent: 6472672 (2002-10-01), Muraki
patent: 6552353 (2003-04-01), Muraki
patent: 6559456 (2003-05-01), Muraki
patent: 6559463 (2003-05-01), Ono et al.
patent: 6566664 (2003-05-01), Muraki
patent: 6583430 (2003-06-01), Muraki
patent: 6802986 (2004-10-01), Nakano
patent: 6872950 (2005-03-01), Shimada et al.
patent: 2002/0160311 (2002-10-01), Muraki et al.
patent: 2002/0179855 (2002-12-01), Muraki
Asano Kouji
Esashi Masayoshi
Hashimoto Shin'ichi
Iwasaki Yuichi
Moro Yoshiaki
Canon Kabushiki Kaisha
Fitzpatrick ,Cella, Harper & Scinto
Gurzo Paul M.
Hitachi , Ltd.
Lee John R.
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