Deflection lens system for generating a beam of neutral particle

Details Deflection lens system for generating a beam of neutral particle Deflection lens system for generating a beam of neutral particle

1986-01-08

1986-12-16

Anderson, Bruce C.

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

250251, G21K 108, H05H 300

Patent

active

046298991

ABSTRACT:
An apparatus for deflecting and focusing a beam of neutral particles for operating on extremely small workpieces, such as for doping or inscribing micro-electronic components, has a deflection system for generating at least one magnetic field through which the beam of neutral particles is directed for focusing and shaping of the beam on the workpiece. The lens system may include one or more six-pole or eight-pole lenses.

REFERENCES:
patent: 3387241 (1968-06-01), Aldoin et al.
patent: 3418463 (1968-12-01), Lacey
patent: 3952198 (1976-04-01), Harada et al.
patent: 4236073 (1980-11-01), Martin
patent: 4355236 (1982-10-01), Hoslinger
patent: 4429229 (1984-01-01), Gluckstern
"Emission Characteristics of Gallium and Bismuth Liquid Metal Field Ion Sources," Swanson et al., J. Vac. Sci. Tech., 16(6), Nov./Dec. 1979, pp. 1864-1867.
"High Resolution, Ion Beam Processes for Microstructure Fabrication," Seliger et al., J. Vac. Sci. Tech., 16(6), Nov./Dec. 1979, pp. 1610-1612.
"Quadrupoles in Electron Lens Design," Hawkes, 1970, pp. 3-10, 87-95.

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