Defect repair method, in particular for repairing quartz...

Details Defect repair method, in particular for repairing quartz... Defect repair method, in particular for repairing quartz...

2006-09-19

2006-09-19

Hassanzadeh, Parviz (Department: 1763)

Etching a substrate: processes

Mechanically shaping, deforming, or abrading of substrate

C430S005000

Reexamination Certificate

active

07108798

ABSTRACT:
The invention relates to a defect repair method, in particular for repairing quartz defects on alternating phase shift masks, wherein, for repairing defects (5) existing on one and the same component (1), both, defect repair method steps substantially based on mechanical processes (S3), in particular nanomachining method steps, and defect repair method steps substantially based on etching processes (S2), in particular FIB (Focused Ion Beam) method steps, are used. Moreover, the invention relates to a component (1), in particular a photomask, repaired by making use of such a defect repair method.

REFERENCES:
patent: 2002214760 (2002-07-01), None
M. Verbeek, R. White; High Precision Mask repair Using Nanomachining, pp. 210-217, 18thEuropean Mask Conference on Mask Technology Jan. 15-16, 2002 Munich, Germany.
C. Friedrich, et al., Defect Printability and Repair of Alternating Phase Shift Masks, Abstract, pp. 19-26, date unknown, but prior to the filing of this application.
M. Verbeek, ert al., High Precision Mask Repair Using Nanomachining, Abstract, pp. 187-194, date unknown, but prior to the filing of this application.

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