Defect repair device and defect repair method

Optics: measuring and testing – Inspection of flaws or impurities – Surface condition

Reexamination Certificate

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C430S005000

Reexamination Certificate

active

10885641

ABSTRACT:
A defect repair device includes a defect inspection unit configured to find a size of a protruding defect on a front surface of a multi-layer film having a rear surface opposite to the front surface, a calculation unit configured to calculate a repair energy so as to repair the protruding defect based on the size of the protruding defect found by the defect inspection unit, an energy supplier, and an energy controller configured to control the energy supplier to supply the repair energy calculated by the calculation unit to a portion in the multi-layer film from the rear surface of the multi-layer film so as to cause a decrease in a volume of the portion and retract the protruding defect into the multi-layer film.

REFERENCES:
patent: 6340543 (2002-01-01), Nagamura et al.
patent: 6465272 (2002-10-01), Davis, Jr. et al.
patent: 6576380 (2003-06-01), Davis, Jr. et al.
patent: 6590182 (2003-07-01), Domae
patent: 6605392 (2003-08-01), Matsumoto et al.
patent: 6723475 (2004-04-01), Tsukamoto et al.
patent: 6737201 (2004-05-01), Shoki et al.
patent: 6821682 (2004-11-01), Stearns et al.
patent: 6884999 (2005-04-01), Yedur et al.
patent: 2003/0164949 (2003-09-01), Taylor et al.
patent: 2003/0207184 (2003-11-01), Smith
patent: 2005/0032285 (2005-02-01), Imahara et al.
patent: 2005/0254045 (2005-11-01), Weiss et al.
patent: 2006/0007433 (2006-01-01), Ikuta et al.
patent: WO 02/27404 (2002-04-01), None
Barty A. et al.: “EUVL Mask Blank Repair”, Emerging Lithographic Technologies VI, Proceedings of SPIE vol. 4688 (2002), pp. 385-394.
Stivers A. et al.: “Evaluation of the Capability of a Multibeam Confocal Inspection System for Inspection of EUVL Mask Blanks”, 22ndAnnual BACUS Symposium on Photomask Technology, Proceedings of SPIE, vol. 4889 (2002), pp. 408-417.
Ko Y. et al.: “Simulation of Repairing Thin Film Defect in Masks for EUV Lithography”, Metrology, Inspection, and Process Control for Microlithography XVII, Proceedings of SPIE vol. 5038 (2003), pp. 293-302.
U.S. Appl. No. 11/330,205, filed Jan. 12, 2006, Ikuta et al.
Stefan P. Hau-Riege, et al., “Correction of figure errors on optical surfaces by laser-induced contraction of Mo/Si multilayers”, Optics Letters, XP-002367868, vol. 28, No. 6, Mar. 15, 2003, pp. 456-458.
D. G. Stearns, “Thermally induced structural modification of Mo-Si multilayers”, Journal of Applied Phisics, XP-002212713, vol. 67, No. 5, Mar. 1, 1990, pp. 2415-2427.

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