Defect monitor and method for automated contactless inline wafer

Electricity: measuring and testing – Fault detecting in electric circuits and of electric components – Of individual circuit component or element

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324501, G01R 31305

Patent

active

059594594

ABSTRACT:
According to the preferred embodiment, a defect monitor is provided that facilitates the location and characterization of defects in a semiconductor device. The defect monitors are designed to facilitate automated scanning electron microscope in voltage contrast mode (SEM-VC) inspection. The defect monitors include a plurality of flags used to quickly locate defects. The SEM-VC magnification can then be increased to further isolate and characterize the defects as necessary. Thus, the preferred embodiment facilitates the use of SEM-VC scanning procedures to automatically detect and locate faults at low magnification, and then characterize the faults a higher magnification, resulting in a much higher throughput.

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Bentson, L.R. "Monitoring Defects by Scanning Electron Microscope Beam Charging", IBM Technical Disclosure Bulletin, BU884-0024, vol. 31, No. 6, Nov. 1988, pp. 476-477.

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