Defect mitigation in spatial light modulator used for...

Details Defect mitigation in spatial light modulator used for... Defect mitigation in spatial light modulator used for...

2006-11-07

2006-11-07

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000

Reexamination Certificate

active

07133116

ABSTRACT:
A spatial light modulator for use in a photolithography system includes light modulation elements configured to photolithographically transfer an image onto a substrate using an optical oversampling technique to reduce defects in the transferred image. A first set of the light modulation elements is operable to photolithographically transfer a portion of the image onto an area of a substrate, and a second set of the light modulation elements is operable to photolithographically transfer the portion of the image onto the area of the substrate. The spatial light modulator further includes memory elements in communication with respective light modulation elements for storing data representing the portion of the image.

REFERENCES:
patent: 5721622 (1998-02-01), Venkateswar
patent: 6312134 (2001-11-01), Jain et al.
patent: 6544698 (2003-04-01), Fries
patent: 6606739 (2003-08-01), Kanatake et al.
patent: 6618185 (2003-09-01), Sandstrom
patent: 2005/0046819 (2005-03-01), Bleeker et al.

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