Defect inspection method for a glass substrate for a mask...

Details Defect inspection method for a glass substrate for a mask... Defect inspection method for a glass substrate for a mask...

2011-07-05

2011-07-05

Speer, Timothy M (Department: 1784)

Stock material or miscellaneous articles

Composite

Of quartz or glass

C428S098000

Reexamination Certificate

active

07972702

ABSTRACT:
On inspecting a glass substrate for a mask blank which substrate has surfaces including one end face, the glass substrate is prepared to have the one end face which has a chamfered surface and a remaining surface serving as a side surface. The chamfered surface of the one end face is smaller in width than a chamfered surface of an opposite end face of the glass substrate. A short-wavelength light having a wavelength of 200 nm or less is introduced into the side surface of the one end face. From either the one end face or a different surface of the surfaces of the glass substrate, a long-wavelength light is received which is longer in wavelength than the short-wavelength light and which is generated by an internal defect of the glass substrate in response to the short-wavelength light. The internal defect is detected with reference to the long-wavelength light.

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Japanese Office Action corresponding to Japanese Patent Application No. 2005-171153, dated Oct. 18, 2010, Partial English language translation.

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