Defect inspection method and defect inspection system using...

Optics: measuring and testing – Inspection of flaws or impurities

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

07446864

ABSTRACT:
A surface of a work to be inspected is irradiated with an illumination unit for a coaxial incident illumination and an illumination unit for an oblique incident illumination driven to take its image by a camera at the same time. Each of the illumination units and comprises light sources emitting color lights R, G and B, respectively. One of the three kinds of light sources is lighted in the illumination unit and one or two of the light sources which are not lighted in the illumination unit are lighted in the illumination unit.

REFERENCES:
patent: 5982493 (1999-11-01), Lehnen et al.
patent: 6064478 (2000-05-01), Paul et al.
patent: 6222624 (2001-04-01), Yonezawa
patent: 6668078 (2003-12-01), Bolle et al.
patent: 6928185 (2005-08-01), Yonezawa
patent: 7027640 (2006-04-01), Park et al.
patent: 2001/0000679 (2001-05-01), Vaez-Iravani et al.
patent: 0 452 905 (1991-10-01), None
patent: 1 408 326 (2004-04-01), None
patent: 62-038348 (1987-02-01), None
patent: 01-113639 (1989-05-01), None
patent: 2000-009591 (2000-01-01), None
patent: 2003-075363 (2003-03-01), None
patent: 2004-184241 (2004-07-01), None
patent: WO-01/01118 (2001-01-01), None
patent: WO-01/49043 (2001-07-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Defect inspection method and defect inspection system using... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Defect inspection method and defect inspection system using..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Defect inspection method and defect inspection system using... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4022782

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.