Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2005-08-09
2005-08-09
Mehta, Bhavesh M. (Department: 2625)
Image analysis
Applications
Manufacturing or product inspection
C382S141000, C382S206000, C382S298000, C356S237100, C348S125000
Reexamination Certificate
active
06928185
ABSTRACT:
A defect inspection method of inspecting a defect of an inspection object having a chip pattern, the defect inspection method comprising the steps of: inputting a captured first image of the inspection object; obtaining a second image having a predetermined size based on one of a chip size and a size of exposure shot from the inputted first image; determining an averaged luminance of the obtained second image; and detecting the defect based on the determined averaged luminance and a predetermined inspection condition.
REFERENCES:
patent: 4845558 (1989-07-01), Tsai et al.
patent: 4926452 (1990-05-01), Baker et al.
patent: 4926489 (1990-05-01), Danielson et al.
patent: 5293538 (1994-03-01), Iwata et al.
patent: 5790694 (1998-08-01), Maruo
patent: 5864394 (1999-01-01), Jordan, III et al.
patent: 5907628 (1999-05-01), Yolles et al.
patent: 5995137 (1999-11-01), Yamada et al.
patent: 6148097 (2000-11-01), Nakayama et al.
patent: 6222624 (2001-04-01), Yonezawa
patent: 6286969 (2001-09-01), Kurokawa et al.
patent: 6347150 (2002-02-01), Hiroi et al.
patent: 6529622 (2003-03-01), Pourjavid
patent: 6539106 (2003-03-01), Gallarda et al.
patent: 0 930 498 (1999-07-01), None
patent: 7-209203 (1995-08-01), None
Carter Aaron
Mehta Bhavesh M.
Nidek Co. Ltd.
Sughrue & Mion, PLLC
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