Defect inspection method and defect inspection apparatus

Image analysis – Applications – Manufacturing or product inspection

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C382S141000, C382S206000, C382S298000, C356S237100, C348S125000

Reexamination Certificate

active

06928185

ABSTRACT:
A defect inspection method of inspecting a defect of an inspection object having a chip pattern, the defect inspection method comprising the steps of: inputting a captured first image of the inspection object; obtaining a second image having a predetermined size based on one of a chip size and a size of exposure shot from the inputted first image; determining an averaged luminance of the obtained second image; and detecting the defect based on the determined averaged luminance and a predetermined inspection condition.

REFERENCES:
patent: 4845558 (1989-07-01), Tsai et al.
patent: 4926452 (1990-05-01), Baker et al.
patent: 4926489 (1990-05-01), Danielson et al.
patent: 5293538 (1994-03-01), Iwata et al.
patent: 5790694 (1998-08-01), Maruo
patent: 5864394 (1999-01-01), Jordan, III et al.
patent: 5907628 (1999-05-01), Yolles et al.
patent: 5995137 (1999-11-01), Yamada et al.
patent: 6148097 (2000-11-01), Nakayama et al.
patent: 6222624 (2001-04-01), Yonezawa
patent: 6286969 (2001-09-01), Kurokawa et al.
patent: 6347150 (2002-02-01), Hiroi et al.
patent: 6529622 (2003-03-01), Pourjavid
patent: 6539106 (2003-03-01), Gallarda et al.
patent: 0 930 498 (1999-07-01), None
patent: 7-209203 (1995-08-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Defect inspection method and defect inspection apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Defect inspection method and defect inspection apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Defect inspection method and defect inspection apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3522419

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.