Defect inspection method and apparatus therefor

Optics: measuring and testing – Inspection of flaws or impurities – Surface condition

Reexamination Certificate

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Details

C250S341800, C250S339110, C356S237100

Reexamination Certificate

active

10971109

ABSTRACT:
A defect inspection apparatus for inspecting a fine circuit pattern with high resolution to detect a defective portion is constructed to have an objective lens for detecting an image of a sample, a laser illumination unit for illuminating the sample through the objective lens, a unit for reducing the coherence of the laser illumination, an accumulation type detector, and a unit for processing the detected image signal.

REFERENCES:
patent: 4619508 (1986-10-01), Shibuya et al.
patent: 4791586 (1988-12-01), Maeda et al.
patent: 4930896 (1990-06-01), Horikawa
patent: 4974919 (1990-12-01), Muraki et al.
patent: 5097516 (1992-03-01), Amir
patent: 5198915 (1993-03-01), Watson
patent: 5331169 (1994-07-01), Tanaka et al.
patent: 5333052 (1994-07-01), Finarov
patent: 5414513 (1995-05-01), Leib
patent: 5430548 (1995-07-01), Hiroi et al.
patent: 5479252 (1995-12-01), Worster et al.
patent: 5649022 (1997-07-01), Maeda et al.
patent: 5717518 (1998-02-01), Shafer et al.
patent: 5764363 (1998-06-01), Ooki et al.
patent: 5774222 (1998-06-01), Maeda et al.
patent: 6043932 (2000-03-01), Kusunose
patent: 6091075 (2000-07-01), Shibata et al.
patent: 6326636 (2001-12-01), Isoda et al.
patent: 6369888 (2002-04-01), Karpol et al.
patent: 6400454 (2002-06-01), Noguchi et al.
patent: 6495833 (2002-12-01), Alfano et al.
patent: 6532111 (2003-03-01), Kurtz et al.
patent: 6621571 (2003-09-01), Maeda et al.
patent: 61-212708 (1986-09-01), None
patent: 7-318326 (1995-12-01), None
patent: 07333164 (1995-12-01), None
patent: 08-320294 (1996-12-01), None
patent: 2000-193443 (2000-07-01), None

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