Data processing: measuring – calibrating – or testing – Measurement system in a specific environment – Mechanical measurement system
Reexamination Certificate
2007-07-12
2010-02-16
Cosimano, Edward R (Department: 2863)
Data processing: measuring, calibrating, or testing
Measurement system in a specific environment
Mechanical measurement system
C356S237100, C356S237200, C356S237300, C356S237400, C356S237500, C356S364000, C356S369000, C356S388000, C356S390000, C356S394000, C382S100000, C382S141000, C382S144000, C382S145000, C382S149000, C702S033000, C702S035000, C702S187000, C702S189000
Reexamination Certificate
active
07664608
ABSTRACT:
A pattern inspection apparatus which compares images of regions, corresponding to each other, of patterns that are formed so as to be identical and judges that non-coincident portions in the images are defects. The pattern inspection apparatus is equipped with an image comparing section which plots individual pixels of an inspection subject image in a feature space and detects excessively deviated points in the feature space as defects. Defects can be detected correctly even when the same patterns in images have a brightness difference due to a difference in the thickness of a film formed on a wafer.
REFERENCES:
patent: 4648053 (1987-03-01), Fridge
patent: 4893932 (1990-01-01), Knollenberg
patent: 2006/0002604 (2006-01-01), Sakai et al.
patent: 62-089336 (1987-04-01), None
patent: 63-135848 (1988-06-01), None
patent: 01-117024 (1989-05-01), None
patent: 01-250847 (1989-10-01), None
patent: 05-264467 (1993-10-01), None
patent: 06-258239 (1994-09-01), None
patent: 06-324003 (1994-11-01), None
patent: 08-210989 (1996-08-01), None
patent: 08-271437 (1996-10-01), None
patent: 2001-005961 (2001-01-01), None
patent: 2004-271470 (2004-09-01), None
patent: 2005-158780 (2005-06-01), None
patent: 2005-321273 (2005-11-01), None
patent: 2006-145305 (2006-06-01), None
Kazuhiko Oka; Spectral Polarimetry Using Channel Spectra; O plus E, 2003; pp. 1,248-1,253; vol. 25, No. 11.
Kazuhiko Oka; Compact complete imaging polarimeter using birefringent wedge prisms; Optics Express, Jun. 30, 2003; pp. 1,510-1,519; vol. 11, No. 13.
Hisao Kikuta, et al.; Polarization Image Measuring System; O plus E, 2003; pp. 1,241-1,247; vol. 25, No. 11.
Hamamatsu Akira
Maeda Shunji
Sakai Kaoru
Urano Yuta
Antonelli, Terry Stout & Kraus, LLP.
Cosimano Edward R
Hitachi High-Technologies Corporation
LandOfFree
Defect inspection method and apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Defect inspection method and apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Defect inspection method and apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4201327