Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2011-03-29
2011-03-29
Lu, Tom Y (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C382S145000
Reexamination Certificate
active
07916929
ABSTRACT:
A method of inspecting patterns, including: adjusting a brightness of at least one of a first bright field image and a second bright field image detected from a specimen and directed to similar patterns on differing parts of the specimen, so as to more closely match a brightness; comparing the images which are adjusted in brightness to match with each other to detect dissimilarities indicative of a defect of the pattern, wherein in adjusting the brightness, the brightness between the first bright field image and the second bright field image is adjusted by performing a gradation conversion of at least one of the brightness between the first bright field image and the second bright field image; and wherein in the comparing, said defect of the pattern is detected by using information of a scattered diagram of brightness of the first bright field image and the second bright field image.
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Maeda Shunji
Oka Kenji
Shibata Yukihiro
Shishido Chie
Takagi Yuji
Antonelli, Terry Stout & Kraus, LLP.
Hitachi , Ltd.
Lu Tom Y
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