Defect inspection apparatus

Details Defect inspection apparatus Defect inspection apparatus

2006-09-26

2009-02-17

Yam, Stephen (Department: 2878)

Radiant energy

Photocells; circuits and apparatus

With circuit for evaluating a web, strand, strip, or sheet

C250S559110, C250S23700G, C356S237500

Reexamination Certificate

active

07491959

ABSTRACT:
A defect inspection apparatus includes an illumination optical system which sets a transmission illumination region and a reflection illumination region on an inspection target surface of a mask, first and second imaging units having first and second visual fields which are set on the inspection target surface, an imaging optical system that provides images, which are present on the first and second visual fields, on the first and second imaging units, a defect detection unit which detects a defect of the mask on the basis of the images provided on the first and second imaging units, and a control unit which controls a positional relationship between setting positions of the transmission illumination region and the reflection illumination region and setting positions of the first and second visual fields.

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Japanese Patent Office Action entitled “Notice of Reason for Rejection” mailed May 27, 2008, in corresponding Japanese Patent Application No. 2005-284395.

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