Defect inspecting method and defect inspecting apparatus

Details Defect inspecting method and defect inspecting apparatus Defect inspecting method and defect inspecting apparatus

2007-08-07

2011-10-18

Pham, Hoa (Department: 2886)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

C356S237500, C250S310000

Reexamination Certificate

active

08040504

ABSTRACT:
Provided is a method and apparatus for inspecting a defect of a shape formed on a substrate. Primary inspection is sequentially performed on specific patterns in a plurality of divided regions of the substrate by using an optical method, and one or more regions on which secondary inspection is to be performed are selected from the regions. One or more defects are detected by performing the secondary inspection using an electron beam on the selected regions.

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Office Action issued Nov. 22, 2010, in Korean Patent Application No. 10-2009-7002675, filed Feb. 10, 2009 (with English translation).

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