Defect inspecting apparatus and defect inspecting method

Optics: measuring and testing – Inspection of flaws or impurities – Having predetermined light transmission regions

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G01N 2147

Patent

active

056802072

ABSTRACT:
A defect inspecting apparatus and a defect inspecting method are provided to conduct discriminating detection of minute circuit patterns and foreign particles as well as to detect defectives on the surface of a substrate with a high precision. The beams from a laser light source are converged by a lens to be incident upon an inspecting point. The light emitted from the inspecting point by the incident beam is detected by a photoreceiver. On the light receiving surface of the photoreceiver, a plurality of light receiving areas are provided. Each of the light receiving areas has longitudinal direction and shorter direction on its positively projected view. The arrangement of the light receiving areas is selected in accordance with the arrangement information of the patterns formed on the substrate. The foreign particles and the patterns are distinguished by obtaining the logical product of the output signals from the selected light receiving area.

REFERENCES:
patent: 4556903 (1985-12-01), Blitchington et al.
patent: 4610541 (1986-09-01), Tanimoto et al.
patent: 4740708 (1988-04-01), Batchelder
patent: 4999510 (1991-03-01), Hayano et al.
patent: 5363187 (1994-11-01), Hagiwara et al.

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