Defect inspecting apparatus

Details Defect inspecting apparatus Defect inspecting apparatus

1997-07-10

1998-08-04

Evans, F. L.

Optics: measuring and testing

By dispersed light spectroscopy

Utilizing a spectrometer

356237, G01B 902, G01B 288

Patent

active

057902518

ABSTRACT:
A defect inspecting apparatus for detecting a defect on a mask formed with a predetermined pattern comprises a first illumination system for transmission-illuminating the mask with light beams, a second illumination system for vertically illuminating the mask with the light beams, a first light receiving optical system for receiving illumination light beams emitted from the first illumination system and penetrating the mask and for forming an image, a second light receiving optical system for receiving illumination light beams emitted from the second illumination system and reflected by the mask and for forming an image, a first photoelectric converting element for detecting the image formed by the first light receiving optical system, a second photoelectric converting element for detecting the image formed by the second light receiving optical system and a signal processing circuit for detecting the defect on the basis of signals from the first and second photoelectric converting elements.

REFERENCES:
patent: 4468120 (1984-08-01), Tanimoto et al.
patent: 4669885 (1987-06-01), Ina
patent: 5563702 (1996-10-01), Emery et al.

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