Defect detection system and method for pattern to be inspected u

Radiant energy – Photocells; circuits and apparatus – Optical or pre-photocell system

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250572, G01N 2188

Patent

active

050380486

ABSTRACT:
A defect detection system and method for a pattern to be inspected wherein multiple-focus images of the pattern to be inspected are obtained and a defect on the pattern to be inspected is detected utilizing the multiple-focus images.

REFERENCES:
patent: 4330712 (1982-05-01), Yoshida
patent: 4513441 (1985-04-01), Hemshaw
patent: 4685139 (1987-08-01), Masuda et al.
patent: 4689491 (1987-08-01), Lindow et al.
patent: 4707610 (1987-11-01), Lindow et al.

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