Deep UV photoresist composition with 1,3-disubstituted-5-diazoba

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...

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430165, 430170, 430193, 430326, G03C 154

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active

047358858

ABSTRACT:
Disclosed are substituted derivatives of 5-diazobarbituric acid selected from those having the formulas: ##STR1## wherein R.sub.1 and R.sub.2 are substituents selected from the group consisting of C.sub.3 to C.sub.12 alkyl, cyclohexyl, benzyl and C.sub.2 to C.sub.6 aralkyl groups, wherein R.sub.3 and R.sub.4 are substituents selected from the group consisting of C.sub.1 to C.sub.12 alkyl, cyclohexyl, benzyl or other C.sub.2 to C.sub.6 aralkyl groups and R.sub.5 is selected from the group consisting of .alpha.,.omega.-disubstituted C.sub.2 to C.sub.12 alkyl, methylene dicyclohexyl, or C.sub.1 to C.sub.6 dialkylphenylene.
These compounds provide DUV response with an absorption maximum near 260 nm. The substituents are chosen to be nonabsorbing alkyl groups that allow efficient photobleaching of the sensitizer during exposure.
The sensitizers of the present invention are designed to function in the DUV region and are useful in the manufacture of semi-conductor devices.

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German Publication Agnew Chem. 92(9), 754-55, (1980).
V. Papesch, et al., Pyrimido[5,4-d] [1,2,3]Triazines, J. Org. Chem., vol. 28, pp. 1329-1331 (1963).
Von Egon Fahr, Dihydrodiazoanhydride, Ann., vol. 627, pp. 213-217 (1959).

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