Deep-UV lithography

Details Deep-UV lithography Deep-UV lithography

1986-12-12

1988-09-27

Haroian, Harry N.

Optics: image projectors

Miscellaneous

353121, 353101, 353 99, G03B 2742

Patent

active

047737506

ABSTRACT:
A deep-UV step-and-repeat photolithography system includes a narrow-bandwidth pulsed excimer laser illumination source and an all-fused-silica lens assembly. The system is capable of line definition at the 0.5-micrometer level. One significant feature of the system is its ability to perform wafer focus tracking by simply changing the frequency of the laser.

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