Deep-uv lithography

Details Deep-uv lithography Deep-uv lithography

1988-08-12

1989-11-28

Haroian, Harry N.

Optics: image projectors

Miscellaneous

353100, G03B 2742

Patent

active

048833525

ABSTRACT:
A deep-UV step-and-repeat photolithography system includes a narrow-bandwidth pulsed excimer laser illumination source and an all-fused-silica lens assembly. The system is capable ofline definition at the 0.5-micrometer level. One significant feature of the system is its ability to perform wafer focus tracking by simply changing the frequency of the laser.

REFERENCES:
patent: 3217596 (1965-11-01), Murray et al.
patent: 3633585 (1972-01-01), Mouchart
patent: 4420233 (1983-12-01), Nomoto et al.

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