Deep ultraviolet (UV) lens for use in a photolighography system

Details Deep ultraviolet (UV) lens for use in a photolighography system Deep ultraviolet (UV) lens for use in a photolighography system

1989-12-27

1991-07-16

Arnold, Bruce Y.

350 12, 350438, 350442, G02B 300

Patent

active

050319779

ABSTRACT:
A deep ultraviolet (UV) lens for use in a photolithography system provides enhanced resolution by using shorter wavelengths of light exposure (in the ultraviolet wavelength). The improved lens includes a meniscus and a first mirror for imaging light in the deep ultraviolet range to the meniscus. The meniscus images the light to a plano-convex lens which is located proximately to the concave surface of the meniscus. The lens further includes a pair of optical elements (prisms) proximately located to the plano surface of the plano-convex lens. The present invention provides for operation in the deep ultraviolet range with a aperture in one embodiment of 0.350.

REFERENCES:
patent: 4103989 (1978-08-01), Rosin
patent: 4171871 (1979-10-01), Dill et al.
patent: 4391494 (1983-07-01), Hershel

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