Deep ultraviolet optical imaging system for microlithography and

Details Deep ultraviolet optical imaging system for microlithography and Deep ultraviolet optical imaging system for microlithography and

1994-10-04

1996-09-24

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

2504922, B23K 2600, H01L 21268

Patent

active

055593380

ABSTRACT:
A high resolution, deep UV beam delivery system for exposing a surface, directly or through a mask, for the purpose of photolithography, surface cleaning, microstructuring, pattern microimaging, surface modification or the like, the delivery system including a deep UV radiation source for generating a beam of narrow wavelength deep ultraviolet radiation along a path, a first optical system in the path for homogenizing and shaping the deep UV energy in the path; and a second optical system in the path for directing radiation energy onto the surface of a substrate to be processed, the second optical system including large area mirror structure having a numerical aperture of at least 0.3 and a modular compensation assembly of refractive elements disposed between said large area mirror structure and said substrate and corresponding to the wavelength of the radiation source for compensating (reducing) image curvature introduced into the system by the large area mirror structure.

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Bingham et al., "Principles of Aberration-Corrected Optical Systems", SPIE, vol. 654, (1985), pp. 88+93.

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