Radiant energy – Irradiation of objects or material
Patent
1984-04-30
1986-11-25
Anderson, Bruce C.
Radiant energy
Irradiation of objects or material
250504R, H01L 2126
Patent
active
046251200
ABSTRACT:
Apparatus for irradiating deep ultraviolet (DUV) photoresist-sensitive material on a single substrate, such as a wafer, from a xenon lamp source providing pulsed radiation in the DUV range. A spherical reflector reinforces direct radiation to provide a radiation beam with predetermined divergence confined by a cylindrical baffle. The walls of the baffle are either reflective or absorptive to provide either a curing function or mask exposure imaging function as desired.
A wafer having single layer or multi-layer photoresist material sensitive to DUV is either exposed for imaging for pattern development with high resolution and uniformity even with thin photoresist layers or for curing the patterned layers.
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Anderson Bruce C.
Cohen Donald S.
Guss Paul A.
Morris Birgit E.
RCA Corporation
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