Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1983-06-28
1985-06-11
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430170, 430193, 430326, 534560, G03C 154, G03C 160, C07C11300
Patent
active
045229112
ABSTRACT:
A lithographic resist for use with deep ultra-violet radiation comprising an acidic resin and a diazohomotetramic acid sensitizer.
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patent: 3567451 (1971-03-01), Borden et al.
patent: 3567453 (1971-03-01), Borden
patent: 3573917 (1971-04-01), Okamoto
patent: 4207107 (1980-06-01), Ross
patent: 4284706 (1981-08-01), Clecak et al.
patent: 4339522 (1982-07-01), Balanson et al.
Current Abstracts, vol. 66, No. 2, Issue 710, #258014, 7-1977.
Grant, B. D., "Deep UV Photoresists I. Meldrum's Diazo Sensitizer", IEEE Transactions on Electron Devices, vol. ed. 28, No. 11, pp. 1300-1305.
Clecak Nicholas J.
McKean Dennis R.
Miller Robert D.
Tompkins Terry C.
Willson Carlton G.
Bowers Jr. Charles L.
International Business Machines - Corporation
Walsh Joseph G.
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