Deep ultra-violet lithographic resist composition and process of

Details Deep ultra-violet lithographic resist composition and process of Deep ultra-violet lithographic resist composition and process of

1985-09-12

1986-12-02

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430191, 430192, 430193, 430326, 534556, G03C 154, G03C 160, G03F 726

Patent

active

046264914

ABSTRACT:
Positive deep ultra-violet photoresists which are base developable comprise base soluble polymers and as photosensitive solubilizing agents oligomeric compounds of the formula ##STR1## wherein X is alkylene, arylene, alkoxyalkylene or aralkylene and n is a positive integer such that the molecular weight of the oligomeric compound is from about 500 to about 3000.

REFERENCES:
patent: 3046118 (1962-07-01), Schmidt
patent: 3494767 (1970-02-01), Laridon et al.
patent: 3647443 (1972-03-01), Rauner et al.
patent: 4207107 (1980-06-01), Ross
patent: 4284706 (1981-08-01), Clecak et al.
patent: 4339522 (1982-07-01), Balanson et al.

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