Deep ultra-violet lithographic resist composition and process of

Details Deep ultra-violet lithographic resist composition and process of Deep ultra-violet lithographic resist composition and process of

1985-04-15

1986-11-25

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430193, 430326, 534556, G03C 154, G03C 160, G03F 726

Patent

active

046249087

ABSTRACT:
Positive deep ultra-violet photoresists which are base developable comprise base soluble polymers and as photosensitive solubilizing agents compounds of the formula ##STR1## wherein: R.sub.4 is hydrogen or --C(O)R.sub.5 in which R.sub.5 is an alkoxy group having from 1 to about 20 carbon atoms;

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patent: 4207107 (1980-06-01), Ross
patent: 4284706 (1981-08-01), Clecak et al.
patent: 4339522 (1982-07-01), Balanson et al.
patent: 4522911 (1985-06-01), Clecak et al.
Korobitsyna, I. K. et al., Zh. Org. Khim. 12, pp. 1245-1260, 1976.
Dinaburg, M. S., "Photosensitive Diazo Cpds", The Focal Press, pp. 181-182, 1964.
Current Abstracts, vol. 66, No. 2, #25014, 7/1977.
Grant, B. D. et al., IEEE Transactions on Electron Devices, vol.-ED-28, No. 11, pp. 1300-1305, 11/1981.

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