Deep ultra-violet lithographic resist composition and process of

Details Deep ultra-violet lithographic resist composition and process of Deep ultra-violet lithographic resist composition and process of

1985-09-12

1986-11-11

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430192, 430193, 430326, 534556, G03C 154, G03C 160, G03F 726

Patent

active

046222839

ABSTRACT:
Positive deep ultra-violet photoresists which are base developable comprise base soluble polymers and as photosensitive solubilizing agents compounds of the formula ##STR1## wherein R.sup.1 and R.sup.2 can each individually be alkyl, aryl, alkoxy alkyl, aralkyl or haloalkyl radicals or R.sup.1 and R.sup.2 taken together can be an alkylene radical.

REFERENCES:
patent: 3130048 (1964-04-01), Fritz et al.
patent: 4207107 (1980-06-01), Ross
patent: 4284706 (1981-08-01), Clecak et al.
patent: 4339522 (1982-07-01), Balanson et al.
patent: 4522911 (1985-06-01), Clecak et al.
Grant, B. D. et al., IEEE Transactions on Electron Devices, vol. ED-28, No. 11, pp. 1300-1305, 11/1981.
Korobitsyna, I. K. et al., Zh. Org. Khim, 12, pp. 1245-1260, 1976.
Dinaburg, M. S., "Photosensitive Diazo Cpds.", The Focal Press, pp. 181-182, 1964.

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