Deep u.v. photoresist compositions containing 4-tert-butylstyren

Details Deep u.v. photoresist compositions containing 4-tert-butylstyren Deep u.v. photoresist compositions containing 4-tert-butylstyren

1991-04-30

1993-01-26

Le, Hoa Van

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430191, 430192, 430193, 430272, 430277, 430278, G03F 7023, G03C 161

Patent

active

051821850

ABSTRACT:
Photosensitizers containing saturated and unsaturated polycyclic compounds containing the cyclopentane-2-diazo-1,3-dione structural unit.
These compounds have their maximum u.v. absorption at around 248 nm, decompose into polar products upon irradiation, and can be used as photosensitizers in positive deep u.v. or excimer laser (248 nm) lithography. They are most preferably useful with deep u.v. transparent resins for forming photoresists.

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