Deep dielectric isolation by fused glass

Details Deep dielectric isolation by fused glass Deep dielectric isolation by fused glass

1981-07-27

1985-10-01

Smith, John D.

Coating processes

Electrical product produced

Condenser or capacitor

29576W, 156643, 427 93, 427 95, 427240, 427 96, H01L 2176

Patent

active

045445761

ABSTRACT:
Deep dielectric isolation zones in a substrate are achieved by forming trenches using reactive ion etching. A glass having a coefficient of thermal expansion closely matching that of the substrate is deposited onto the trench to entirely or partially fill the trench. Deposition can be by sedimentation, centrifugation or spin-on techniques. The structure is then fired until the glass particles fuse into a continuous glass layer and final smoothing if necessary can be accomplished.

REFERENCES:
patent: 4019248 (1977-04-01), Black
patent: 4039702 (1977-08-01), Di Bugnara
patent: 4140558 (1979-02-01), Murphy
patent: 4202916 (1980-05-01), Chadda
patent: 4222792 (1980-09-01), Lever
patent: 4356211 (1982-10-01), Riseman
patent: 4404736 (1983-09-01), Koshino

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